Tosoh OP-1 and OP-3 materials are manufactured by fusing high-purity silica powder using Tosoh's proprietary oxy-hydrogen flame fusion process and a method of generating uniformly dispersed small bubbles inside the material. Thanks to its high purity and excellent infrared blocking properties, OP-1 has become the material of choice as a heat-insulating material for semiconductor and solar manufacturing equipment, such as RTP chambers and oxidation, diffusion, and CVD batch furnaces.
OP-3 is an enhanced version of OP-1 material, with further reduced alkali content for use in processes that require extreme contamination control.
OP-3HD is a high-density version of OP-3, with a smaller diameter bubble size distribution that provides enhanced sealing properties and lifetime for advanced batch furnace processes.
Available in up to 1,000mm round and square ingots, OP-1, OP-3, and OP-3HD materials are 450mm wafer ready.